Welcome to the resource topic for 2024/1149
Title:
Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium
Authors: Jean-Sébastien Coron, François Gérard, Tancrède Lepoint, Matthias Trannoy, Rina Zeitoun
Abstract:In this work, we introduce enhanced high-order masking techniques tailored for Dilithium, the post-quantum signature scheme recently standardized by NIST. We improve the masked generation of the masking vector \vec{y}, based on a fast Boolean-to-arithmetic conversion modulo q. We also describe an optimized gadget for the high-order masked rejection sampling, with a complexity independent from the size of the modulus q. We prove the security of our gadgets in the classical ISW t-probing model. Finally, we detail our open-source C implementation of these gadgets integrated into a fully masked Dilithium implementation, and provide an efficiency comparison with previous works.
ePrint: https://eprint.iacr.org/2024/1149
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